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Managed by team of experienced and dedicated professionals, we are engaged in manufacturing, exporting and supplying high quality Titanium Oxide Sputtering Target. This sputtering target is widely used in solar cells, antistatic films, flat panel displays and some other electronic appliances. Besides, the offered sputtering target is essential to form electrically conductive transparent thin films for electrodes. It is processed through conventional dc magnetron sputtering process by making use of premium grade starting materials, In2O3 powders,TiO2 powders, etc with the aid of latest processing procedures. We are providing this Titanium Dioxide (TiO2) Sputtering Targets at reasonable prices to our clients.
Advantages & Features:
Application of Products:
Titanium Oxide Sputtering Target used in TN, STN-type liquid crystal display (LCD) , touch panel (TP), and many other fields.Production Type:
|Composition||In2O3:TiO2=98:2mol%(Other raitos)to match customer's requirements|
|Purity||4N (see schedule)|
|Physical Specifications||flaky or other shape, its size and the deviation from the two sides agreed to supply and demand|
|Appearance||exterior color uniformity; surface smooth, free of cracks, chipping, and without any inclusions and contaminants|
|Internal Defects||internal no cracks, no exotic matter|
|Impurities（×10-6）less than unit：wt%|
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